Journal
OPTICS EXPRESS
Volume 20, Issue 27, Pages 29111-29120Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.20.029111
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Funding
- National Research Foundation of Korea (NRF)
- Ministry of Education, Science and Technology [2012R1A2A1A01010307]
- National Research Foundation of Korea [2012R1A2A1A01010307] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Adaptive mass fabrication method based on laser-induced plasmonic local surface defunctionalization was suggested to realize solution-based high resolution self-patterning on transparent substrate in parallel. After non-patterned functional monolayer was locally deactivated by laser-induced metallic plasma species, various micro/nano metal structures could be simultaneously fabricated by the parallel self-selective deposition of metal nanoparticles on a specific region. This method makes the eco-friendly and cost-effective production of high resolution pattern possible. Moreover, it can respond to design change actively due to the broad controllable range and easy change of key patterning specifications such as a resolution (subwavelength similar to 100 mu m), thickness (100 nm similar to 6 mu m), type (dot and line), and shape. (C) 2012 Optical Society of America
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