4.6 Article

Solution-based adaptive parallel patterning by laser-induced local plasmonic surface defunctionalization

Journal

OPTICS EXPRESS
Volume 20, Issue 27, Pages 29111-29120

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.20.029111

Keywords

-

Categories

Funding

  1. National Research Foundation of Korea (NRF)
  2. Ministry of Education, Science and Technology [2012R1A2A1A01010307]
  3. National Research Foundation of Korea [2012R1A2A1A01010307] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

Ask authors/readers for more resources

Adaptive mass fabrication method based on laser-induced plasmonic local surface defunctionalization was suggested to realize solution-based high resolution self-patterning on transparent substrate in parallel. After non-patterned functional monolayer was locally deactivated by laser-induced metallic plasma species, various micro/nano metal structures could be simultaneously fabricated by the parallel self-selective deposition of metal nanoparticles on a specific region. This method makes the eco-friendly and cost-effective production of high resolution pattern possible. Moreover, it can respond to design change actively due to the broad controllable range and easy change of key patterning specifications such as a resolution (subwavelength similar to 100 mu m), thickness (100 nm similar to 6 mu m), type (dot and line), and shape. (C) 2012 Optical Society of America

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available