Journal
OPTICS EXPRESS
Volume 19, Issue 9, Pages 8684-8692Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.19.008684
Keywords
-
Categories
Funding
- Bundesministerium fur Bildung und Forschung (BMBF) [FKZ 13N9712, 13N9433]
Ask authors/readers for more resources
Recent research revealed that using the effective medium approach to generate arbitrary multi-phase level computer-generated holograms is a promising alternative to the conventional multi-height level approach. Although this method reduces the fabrication effort using one-step binary lithography, the subwavelength patterning process remains a huge challenge, particularly for large-scale applications. To reduce the writing time on variable shaped electron beam writing systems, an optimized strategy based on an appropriate reshaping of the binary subwavelength structures is illustrated. This strategy was applied to fabricate a three-phase level CGH in the visible range, showing promising experimental results. (C) 2011 Optical Society of America
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available