4.6 Article

Photolithographically fabricated low-loss asymmetric silicon slot waveguides

Journal

OPTICS EXPRESS
Volume 19, Issue 11, Pages 10950-10958

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.19.010950

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Funding

  1. AFOSR [FA9550-10-1-0053]
  2. CBET/BISH [0930411]
  3. National Science Foundation (NSF) STC MDITR Center [DMR0120967]
  4. Washington Research Foundation

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We demonstrate low-loss asymmetric slot waveguides in siliconon- insulator (SOI). 130 and 180 nm wide slots were fabricated with a 248 nm stepper, in 200 nm thick silicon. An asymmetric waveguide design is shown to expand the range in which the TE0 mode is guided and suppress the TE1 mode, while still maintaining a sharp concentration of electric field in the center of the slot. Optical propagation losses of 2 dB/cm or less are shown for asymmetric slot waveguides with 130 nm wide slots and 320 and 100 nm wide arms. (C) 2011 Optical Society of America

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