Journal
OPTICS EXPRESS
Volume 19, Issue 1, Pages A41-A50Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.19.000A41
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Funding
- Ministry of Education, Science and Technology (MEST) [2010-0002231, 2010-0000231, 20090083229]
- Korea Government Ministry of Knowledge Economy [2009T100100614]
- Brain Korea 21 Project
- National Research Foundation of Korea [2008-0058952, 2008-2002964, 2009-0083007] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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A combined wire structure, made up of longer periodic Si microwires and short nanoneedles, was prepared to enhance light absorption using one-step plasma etching via lithographical patterning. The combined wire array exhibited light absorption of up to similar to 97.6% from 300 to 1100 nm without an anti-reflection coating. These combined wire arrays on a Si substrate were embedded into a transparent polymer. A large-scale wire-embedded soft film was then obtained by peeling the polymer-embedded wire portion from the substrate. Optically attractive features were present in these soft films, making them suitable for use in flexible silicon solar cell applications. (C)2010 Optical Society of America
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