Journal
OPTICS EXPRESS
Volume 18, Issue 2, Pages 1469-1478Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.18.001469
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Funding
- Defense Advanced Research Projects Agency's ULLW program
- Department of Energy [DE-SC52-06NA27341]
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A thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As2S3 chalcogenide glass to reduce the sidewall roughness and associated optical scattering loss. We show that the reflow process effectively decreases sidewall roughness of chalcogenide glass waveguides. A kinetic model is presented to quantitatively explain the sidewall roughness evolution during thermal reflow. Further, we develop a technique to calculate waveguide optical loss using the roughness evolution model, and predict the ultimate low loss limit in reflowed high-index-contrast glass waveguides. Up to 50% optical loss reduction after reflow treatment is experimentally observed, and the practical loss limiting factors are discussed. (C) 2009 Optical Society of America
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