4.6 Article

Measuring residual stress of anisotropic thin film by fast Fourier transform

Journal

OPTICS EXPRESS
Volume 18, Issue 16, Pages 16594-16600

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.18.016594

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Funding

  1. National Science Council of Taiwan [NSC 96-2221-E-035-067-MY3]

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A new method for the measurement of anisotropic stress in thin films based on 2-D fast Fourier transform (FFT) is presented. A modified Twyman-Green interferometer was used for surface topography measurement. A fringe normalization technique was also used to improve the phase extraction technique efficiently. The measurement of anisotropic stress in obliquely deposited MgF2 thin film was demonstrated. (C) 2010 Optical Society of America

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