Journal
OPTICS EXPRESS
Volume 18, Issue 23, Pages 23933-23938Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.18.023933
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Funding
- U.S. Department of Energy by Lawrence Livermore National Laboratory [DE-AC52-07NA27344]
- Foundation for Fundamental Research on Matter (Stichting voor Fundamenteel Onderzoek der Materie, FOM)
- Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)
- Ministry of Science and Higher Education of Poland [DESY/68/2007]
- Czech Ministry of Education [LC510, LC528, LA08024, ME10046]
- Academy of Sciences of the Czech Republic [Z10100523, IAA400100701, IAAX00100903, KAN300100702]
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Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 mu J and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays. (C) 2010 Optical Society of America
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