Journal
OPTICS COMMUNICATIONS
Volume 285, Issue 24, Pages 5475-5479Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optcom.2012.06.074
Keywords
Antireflection; Nanostructure; Nanosilver islands; Nanoparticles; Colloidal lithography
Categories
Funding
- Basic Science Research Program [2011-0028585]
- Global Frontier RD program [2011-0031563]
- National Research Foundation of Korea (NRF) under Ministry of Education, Science, and Technology in Korea
Ask authors/readers for more resources
Advanced fabrication methods for antireflective nanostructures are presented via the formation of thermally grown nanosilver islands from continuously deposited colloidal multilayers, followed by a multi-step reactive ion etch (RIE) with optimized gas mixture rate. This process allows the formation of a random array of nanostructures of diameter 150 nm or less and height greater than 200 nm. The reflectance falls to around 0.7% in the visible region, with reasonably enhanced broadband stability and reduced incidence angle dependence. The tunability of antireflection was investigated with respect to several parameters associated with the nanosilver etch mask fabrication and RIE conditions. (C)12 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available