4.5 Article

Design and analysis of a vertical directional coupler between a three-dimensional plasmonic slot waveguide and a silicon waveguide

Journal

OPTICS COMMUNICATIONS
Volume 284, Issue 14, Pages 3522-3527

Publisher

ELSEVIER
DOI: 10.1016/j.optcom.2011.03.062

Keywords

Plasmonics; Surface plasmon polariton; Metal-insulator-metal waveguide; Silicon photonics

Categories

Funding

  1. Ministry of Education, Science and Technology [2010-0022473]
  2. National Research Foundation of Korea [2010-0022473] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The design of a vertical directional coupler between a three-dimensional plasmonic slot waveguide and a silicon waveguide is theoretically investigated in detail. It consists of two steps: the design of isolated plasmonic slot waveguide and silicon waveguide and the determination of the gap between the two waveguides and the length of a coupling region. The designed structure transfers 70.8% of the power carried by the silicon waveguide mode to the plasmonic slot waveguide mode when the gap is 150 nm and the coupling length is 2.14 mu m. The wavelength dependence of our vertical directional coupler is also studied. The analysis shows that the amount of the transferred power changes slightly over a very wide wavelength range between 1.40 mu m and 1.61 mu m. Moreover, if we employ the fabrication technology for silicon photonics, it is quite tolerant to the variation of the length of its coupling section. Finally, the vertical directional coupler is considered for a polarizer. (c) 2011 Elsevier B.V. All rights reserved.

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