4.7 Article

Investigation on properties of TiO2 thin films deposited at different oxygen pressures

Journal

OPTICS AND LASER TECHNOLOGY
Volume 40, Issue 3, Pages 550-554

Publisher

ELSEVIER SCI LTD
DOI: 10.1016/j.optlastec.2007.09.003

Keywords

TiO2 thin films; residual stress; electron beam evaporation

Ask authors/readers for more resources

TiO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO2 thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO2 thin films all were amorphous because deposition particles did not possess enough energy to crystallize. (C) 2007 Elsevier Ltd. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available