Journal
OPTICS AND LASER TECHNOLOGY
Volume 40, Issue 3, Pages 550-554Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.optlastec.2007.09.003
Keywords
TiO2 thin films; residual stress; electron beam evaporation
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TiO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on optical, mechanical and structural properties of TiO2 thin films were studied. The results showed that with the increase of oxygen partial pressure, the optical transmittance gradually increased, the transmittance edge gradually shifted to short wavelength, and the corresponding refractive index decreased. The residual stresses of all samples were tensile, and the value increased as oxygen partial pressure increasing, which corresponded to the evolutions of the packing densities. The structures of TiO2 thin films all were amorphous because deposition particles did not possess enough energy to crystallize. (C) 2007 Elsevier Ltd. All rights reserved.
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