Journal
OPTICAL MATERIALS
Volume 84, Issue -, Pages 893-898Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2018.08.011
Keywords
Thin film; Optical limiting; Saturable absorber
Categories
Funding
- UGC-DAE-CSR, Indore [CSR-IC-BL-61/CRS-178/2016-17/842, CSR-IC-237/2017-18/1318]
- SERB, Govt. of India, New Delhi [EMR/2016/002500]
- UGC, New Delhi, India [F.530/17/DRS-I2016(SAP-I)]
Ask authors/readers for more resources
Effect of magnetic field on the absorptive optical nonlinearity in ion beam sputtered as-deposited and annealed NiO thin films have been studied and the magnetic field dependent nonlinear absorption coefficients are obtained. As-deposited NiO thin film is more sensitive to magnetic field due to higher percentage of oxygen vacancies and shows gradual variation as well as sign reversal of nonlinear absorption coefficients with increase in applied magnetic field. In annealed film, we found increase in nonlinear absorption coefficient with increasing magnetic field.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available