Journal
OPTICAL MATERIALS
Volume 35, Issue 3, Pages 431-439Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2012.09.028
Keywords
Mn:ZnO thin Films; RF sputtering; z-scan; cw laser; NLO; Optical limiting
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Funding
- Vision Group on Science and Technology, Department of Science and Technology, Govt. of Karnataka
- DST [SR/FTP/PS-33/2005]
- NITK/MHRD
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We report the measurements of third-order nonlinear optical properties of undoped zinc oxide and manganese doped zinc oxide thin films with different doping concentrations investigated using z-scan technique. Thin films were prepared by radio frequency magnetron sputtering using a compound target on glass substrate at room temperature. The structural properties of the deposited films were analysed by X-ray diffraction studies. The atomic force microscope analysis of the deposited films reveals that the grain size and roughness of the films depend on the Mn concentration. The direct energy band gap of the deposited film increases with the increase in Mn concentration in the films. The nonlinear optical measurements were carried out using a cw He-Ne laser at 633 nm wavelength. The z-scan results reveal that the films exhibit self-defocusing nonlinearity. The third-order nonlinear optical susceptibility chi((3)) is found to be of the order of 10(-3) esu. The films investigated here exhibit good optical power limiting at the experimental wavelength. (c) 2012 Elsevier B.V. All rights reserved.
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