Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume 339, Issue -, Pages 63-66Publisher
ELSEVIER
DOI: 10.1016/j.nimb.2014.03.009
Keywords
Molecular dynamics; Ion irradiation; Sputtering; Electric field
Categories
Funding
- European Commission, Belgium under the FP7 Research Infrastructures project EuCARD [227579]
- Academy of Finland
- University of Helsinki
Ask authors/readers for more resources
The presence of high electric fields may affect significantly the process of sputtering of metal surfaces by energetic ions, especially in the vicinity of rough surface features. The effect can be significant if the energy of ions is fairly low. Moreover, the nanosized rough surface features - invisible to a naked eye, both intrinsic ones due to technological processing of surfaces and those forming because of sputtering - may affect the topology of surface erosion under ion bombardment. In this work we study by means of concurrent electrodynamics-molecular dynamics the sputtering yield of Cu+ ions hitting a flat Cu surface or a nanosized Cu protrusion as a function of both ion energy and electric field strength. The results show that the sputtering yield is significantly enhanced in the presence of an electric field in both cases. (C) 2014 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available