Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume 267, Issue 14, Pages 2376-2380Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2009.03.103
Keywords
Proton beam writing; High aspect ratio; Electroplating; Au microstructure
Categories
Funding
- MOE Academic Research Fund [R-144-000-130-112]
- SSLS under NUS Core [C-380-003-003-001]
- A STAR/MOE [RP 3979908 M]
- A*STAR [12 105 0038]
Ask authors/readers for more resources
We present an approach to fabricate tall high aspect ratio Au microstructures by means of proton beam direct writing. Combining proton beam direct writing and electroplating, we successfully produced gold structures with sub-micrometer lateral dimensions, structure heights in excess of 11 mu m, and aspect ratios over 28. Sidewall quality of the Au structures was improved by lowering the process temperature to 20 degrees C when developing PMMA patterns with GG developer. The application of such structures as X-ray masks for deep X-ray lithography with synchrotron radiation was demonstrated. (C) 2009 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available