Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
Volume 647, Issue 1, Pages 125-131Publisher
ELSEVIER
DOI: 10.1016/j.nima.2011.05.033
Keywords
Laser-plasma; Extreme ultraviolet; EUV optics; Polymer processing
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Funding
- Ministry of Science and Higher Education of Poland [N N202 174939]
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In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a double-stream gas puff target created in a vacuum chamber synchronously with the pumping laser pulse. The target is formed by pulsed injection of Kr, Xe or a KrXe gas mixture into a hollow stream of helium. The EUV radiation is focused using a grazing incidence gold-plated ellipsoidal collector. Spectrum of the reflected radiation consists of a narrow feature with intensity maximum at 10-11 nm wavelength and a long-wavelength spectral tail up to 70 nm. The exact spectral distribution depends on a gas applied for plasma creation. To avoid strong absorption of the EUV radiation in a residual gas present in the chamber during the source operation a two step differential pumping system was employed. The system allows for polymer processing under relatively high vacuum conditions (10(-5) mbar) or in a reactive gas atmosphere. Polymer samples can be irradiated in a focal plane of the EUV collector or at some distance downstream the focal plane. This way fluence of the EUV beam at the polymer surface can be regulated. (C) 2011 Elsevier B.V. All rights reserved.
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