Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 137, Issue -, Pages 73-78Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.solmat.2015.01.033
Keywords
ZnO/Ni multilayer film; Back electrode; Electroless nickel plating; Sol-gel method; Photoelectric performance
Funding
- Scientific and Technological Program in Shandong Province of China [2010G0020318]
- Shandong Education Bureau Project [J12LA12]
- Scientific and Technological Program of Jinan [201401233]
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In order to improve the conversion efficiency of the solar cell, the ZnO/Ni multilayer thin film used in back electrode was prepared through the electroless plating and sol-gel methods. The morphology, structure and resistivity of the electroless nickel coating were measured by scanning electron microscopy, X-ray diffraction, and four-point probe resistivity tester, respectively. It was found that the nickel coating presented crystalline structure with the lowest resistivity of 4.33 x 10(-5) Omega cm. The effect of the ZnO sol concentration, annealing temperature and the number of the spin-coating layers on the crystal structure, film morphology and photoelectric performance were also studied. The light trapping structure was found on the surface of ZnO layer when the sol concentration, annealing temperature and the number of the spin-coating layers were 0.75 mol/L, 300 degrees C and 4, respectively. The average transmittance in the visible light range (390-780 nm) was about 1.06% by visible spectrophotometer. The ZnO/Ni multilayer film could be used in back electrode for solar cell and would improve the properties of the solar cell. (C) 2015 Elsevier B.V. All rights reserved.
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