4.8 Article

Sketched oxide single-electron transistor

Journal

NATURE NANOTECHNOLOGY
Volume 6, Issue 6, Pages 343-347

Publisher

NATURE PUBLISHING GROUP
DOI: 10.1038/nnano.2011.56

Keywords

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Funding

  1. US National Science Foundation [DMR-0704022, DMR-0906443]
  2. US Defense Advanced Research Projects Agency [W911NF-09-10258]
  3. US Army Research Office [W911NF-08-1-0317]
  4. The Fine Foundation
  5. US Air Force Office of Scientific Research [FA9550-10-1-0524]
  6. David and Lucile Packard Fellowship
  7. Fundacao de Amparo a Pesquisa do Estado de Sao Paulo - FAPESP [05/04643-7]
  8. Division Of Materials Research
  9. Direct For Mathematical & Physical Scien [0906443] Funding Source: National Science Foundation
  10. Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP) [05/04643-7] Funding Source: FAPESP

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Devices that confine and process single electrons represent an important scaling limit of electronics(1,2). Such devices have been realized in a variety of materials and exhibit remarkable electronic, optical and spintronic properties(3-5). Here, we use an atomic force microscope tip to reversibly 'sketch' single-electron transistors by controlling a metal-insulator transition at the interface of two oxides(6-8). In these devices, single electrons tunnel resonantly between source and drain electrodes through a conducting oxide island with a diameter of similar to 1.5 nm. We demonstrate control over the number of electrons on the island using bottom-and side-gate electrodes, and observe hysteresis in electron occupation that is attributed to ferroelectricity within the oxide heterostructure. These single-electron devices may find use as ultradense non-volatile memories, nanoscale hybrid piezoelectric and charge sensors, as well as building blocks in quantum information processing and simulation platforms.

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