4.8 Article

Ultralow-voltage field-ionization discharge on whiskered silicon nanowires for gas-sensing applications

Journal

NATURE MATERIALS
Volume 10, Issue 2, Pages 135-140

Publisher

NATURE PUBLISHING GROUP
DOI: 10.1038/nmat2944

Keywords

-

Funding

  1. Natural Sciences and Engineering Research Council (NSERC) of Canada
  2. UC Davis
  3. Army Research Office (ARO) [55176-EL-DRP]
  4. Hewlett-Packard Labs.

Ask authors/readers for more resources

Several hundred million volts per centimetre of electric-field strength are required to field-ionize gas species. Such fields are produced on sharp metallic tips under a bias of a few kilovolts. Here, we show that field ionization is possible at dramatically lower fields on semiconductor nanomaterials containing surface states, particularly with metal-catalysed whiskers grown on silicon nanowires. The low-voltage field-ionization phenomena observed here cannot be explained solely on the basis of the large field-amplification effect of suspended gold nanoparticles present on the whisker tips. We postulate that field penetration causes upward band-bending at the surface of exposed silicon containing surface states in the vicinity of the catalyst. Band-bending enables the valence electron to tunnel into the surface states at reduced fields. This work provides a basis for development of low-voltage ionization sensors. Although demonstrated on silicon, low-voltage field ionization can be detected on any sharp semiconductor tip containing proper surface states.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.8
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available