4.8 Article

Conduction at domain walls in oxide multiferroics

Journal

NATURE MATERIALS
Volume 8, Issue 3, Pages 229-234

Publisher

NATURE PUBLISHING GROUP
DOI: 10.1038/NMAT2373

Keywords

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Funding

  1. US Department of Energy [DE-AC02-05CH1123]
  2. National Center for Electron Microscopy
  3. Lawrence Berkeley National Laboratory
  4. Alexander von Humboldt Foundation
  5. National Science Council [NSC 97-3114-M-009-001]
  6. Deutsche Forschungsgemeinschaft
  7. Deutsche Akademische Austauschdienst [GE 1202/5-1]
  8. NSF [DMR-0605852]
  9. Miller Institute for Basic Research in Science
  10. UC Berkeley

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Domain walls may play an important role in future electronic devices, given their small size as well as the fact that their location can be controlled. Here, we report the observation of room-temperature electronic conductivity at ferroelectric domain walls in the insulating multiferroic BiFeO3. The origin and nature of the observed conductivity are probed using a combination of conductive atomic force microscopy, high-resolution transmission electron microscopy and first-principles density functional computations. Our analyses indicate that the conductivity correlates with structurally driven changes in both the electrostatic potential and the local electronic structure, which shows a decrease in the bandgap at the domain wall. Additionally, we demonstrate the potential for device applications of such conducting nanoscale features.

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