Journal
NANOTECHNOLOGY
Volume 25, Issue 20, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/25/20/205301
Keywords
silicon; localized surface plasmon resonances; molecular beam epitaxy; gallium; patterned substrates
Funding
- CARIPLO Foundation (EIDOS) [2011-0382]
- NSF [DMS-0810113, DMS-0854870, DMS-1115252]
- Direct For Mathematical & Physical Scien [1115252] Funding Source: National Science Foundation
- Direct For Mathematical & Physical Scien
- Division Of Mathematical Sciences [0854870] Funding Source: National Science Foundation
- Division Of Mathematical Sciences [1115252] Funding Source: National Science Foundation
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We fabricate site-controlled, ordered arrays of embedded Ga nanoparticles on Si, using a combination of substrate patterning and molecular-beam epitaxial growth. The fabrication process consists of two steps. Ga droplets are initially nucleated in an ordered array of inverted pyramidal pits, and then partially crystallized by exposure to an As flux, which promotes the formation of a GaAs shell that seals the Ga nanoparticle within two semiconductor layers. The nanoparticle formation process has been investigated through a combination of extensive chemical and structural characterization and theoretical kinetic Monte Carlo simulations.
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