Journal
NANOTECHNOLOGY
Volume 23, Issue 17, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/23/17/175303
Keywords
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Funding
- NSF Center for Nano-Chemical Electro-Mechanical Manufacturing Systems
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We report fabrication and use of a flexible array of nano-apertures for photolithography on curved surfaces. The batch-fabricated apertures are formed of metal-coated silicone tips. The apertures are formed at the end of the silicone tips by either electrochemical etching of the metal or plasma etching of a protective mask followed by wet chemical etching. The apertures are as small as 250 nm on substrates larger than several millimeters. We demonstrate how the nano-aperture array can be used for nano-fabrication on flat and curved substrates, and show the subsequent fabrication steps to form large arrays of sub-micron aluminum dots or vertical silicon wires.
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