4.6 Article

Interfacial toughening of solution processed Ag nanoparticle thin films by organic residuals

Journal

NANOTECHNOLOGY
Volume 23, Issue 48, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/23/48/485704

Keywords

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Funding

  1. Basic Science Research Program [2012006072]
  2. Future-based Technology Development Program (Nano Fields) [2011-0019168]
  3. National Research Foundation of Korea (NRF) [2011-0027669]
  4. Korean government (MEST)
  5. MCP Core Technologies for the Next Generation Project of Ministry of Knowledge Economy of Korea
  6. National Research Council of Science & Technology (NST), Republic of Korea [OD0120] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  7. National Research Foundation of Korea [2012R1A1A1006072, 2009-0082527, 2011R1A2A2A02649388] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Reliable integration of solution processed nanoparticle thin films for next generation low-cost flexible electronics is limited by mechanical damage in the form of delamination and cracking of the films, which has not been investigated quantitatively or systematically. Here, we directly measured the interfacial fracture energy of silver nanoparticle thin films by using double cantilever beam fracture mechanics testing. It was demonstrated that the thermal annealing temperature and period affect the interfacial fracture energy. Also it was found that the interfacial fracture resistance can be maximized with optimized annealing conditions by the formation of organic residual bridges during the annealing process.

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