Journal
NANOTECHNOLOGY
Volume 21, Issue 50, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/21/50/505302
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Funding
- Ministry of Knowledge Economy [RBD-0901-B0192-0]
- Seoul Scholarship Foundation
- Ministry of Knowledge Economy (MKE), Republic of Korea [RBD-0901-027] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Micron-sized and precise patterns of nanocrystalline CVD diamond were fabricated successfully on substrates using dispersed nanodiamond particles, charge connection by electrostatic self-assembly, and photolithography processes. Nanodiamond particles which had been dispersed using an attritional milling system were attached electrostatically on substrates as nuclei for diamond growth. In this milling process, poly sodium 4-styrene sulfonate (PSS) was added as an anionic dispersion agent to produce the PSS/nanodiamond conjugates. Ultra dispersed nanodiamond particles with a zeta-potential and average particle size of -60.5 mV and similar to 15 nm, respectively, were obtained after this milling process. These PSS/nanodiamond conjugates were attached electrostatically to a cationic polyethyleneimine (PEI) coated surface on to which a photoresist had been patterned in an aqueous solution of the PSS/nanodiamond conjugated suspension. A selectively seeded area was formed successfully using the above process. A hot filament chemical vapor deposition system was used to synthesize the nanocrystalline CVD diamond on the seeded area. Micron-sized, thin and precise nanocrystalline CVD diamond patterns with a high nucleation density (3.8 +/- 0.4 x 10(11) cm(-2)) and smooth surface were consequently fabricated.
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