Journal
NANOTECHNOLOGY
Volume 19, Issue 24, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/19/24/245603
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A novel dual-plasma system has been developed to combine the synthesis of silicon nanocrystals ( Si-NCs), the etching to controllably tailor the Si-NC size, and the surface functionalization of Si-NCs into one simple all-gas-phase process. Si-NCs are synthesized in SiH4-based plasma; they then travel through CF4-based plasma, where Si-NCs are etched and passivated by C and F. The resulting Si-NCs exhibit air-stable emission across the full visible spectrum. Structural and optical characterization indicates that the emission in the red-to-green range is based on the recombination of quantum-confined excitons in Si-NCs, while the blue emission originates from defect states. The quantum yields of stabilized photoluminescence from Si-NCs range from 16% at the red end to 1% at the blue end.
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