Journal
NANOSCALE
Volume 10, Issue 34, Pages 16231-16242Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c8nr04781b
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Funding
- EPSRC
- Jaguar Land Rover
- University of Warwick
- Birmingham Science City AM1 project - Advantage West Midlands (AWM)
- Birmingham Science City AM2 project - Advantage West Midlands (AWM)
- European Regional Development Fund (ERDF)
- EPSRC [1790547, EP/G009511/1] Funding Source: UKRI
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The facile silane functionalization of graphene oxide (GO) was achieved yielding vinyltrimethoxysilane-reduced graphene oxide (VTMOS-rGO) nanospheres located in the inter-layer spacing between rGO sheets via an acid-base reaction using aqueous media. The successful grafting of the silane agent with pendant vinyl groups to rGO was confirmed by a combination of Fourier-transform infrared (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The structure and speciation of the silane-graphene network (nanosphere) and, the presence of free vinyl groups was verified from solid-state magic angle spinning (MAS) and solution C-13 and Si-29 nuclear magnetic resonance (NMR) measurements. Evidence from Scanning Electron Microscopy (SEM), High-Resolution Transmission Electron Microscopy (HRTEM) and TEM-High-Angle Annular Dark-Field (TEM-HAADF) imaging showed that these silane networks aided the exfoliation of the rGO layers preventing agglomeration, the interlayer spacing increased by 10 angstrom. The thermal stability (TGA/DTA) of VTMOS-rGO was significantly improved relative to GO, displaying just one degradation process for the silane network some 300 degrees C higher than either VTMOS or GO alone. The reduction of GO to VTMOS-rGO induced sp(2) hybridization and enhanced the electrical conductivity of GO by 10(5) S m(-1).
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