4.8 Article

Graphene-GaN Schottky diodes

Journal

NANO RESEARCH
Volume 8, Issue 4, Pages 1327-1338

Publisher

TSINGHUA UNIV PRESS
DOI: 10.1007/s12274-014-0624-7

Keywords

graphene; GaN; Schottky diode; Schottky barrier height; Fermi level pinning

Funding

  1. Priority Research Center Program through the National Research Foundation of Korea - Ministry of Education, Science and Technology of the Korean government [2011-0027956]
  2. Ministry of Education
  3. National Research Foundation of Korea (NRF) [2013H1B8A2032197]
  4. National Research Foundation of Korea [2013H1B8A2032197] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The electrical characteristics of graphene Schottky contacts formed on undoped GaN semiconductors were investigated. Excellent rectifying behavior with a rectification ratio of similar to 10(7) at +/- 2 V and a low reverse leakage current of 1.0 x 10(-8) A/cm(2) at -5 V were observed. The Schottky barrier heights, as determined by the thermionic emission model, Richardson plots, and barrier inhomogeneity model, were 0.90, 0.72, and 1.24 +/- 0.13 eV, respectively. Despite the predicted low barrier height of similar to 0.4 eV at the graphene-GaN interface, the formation of excellent rectifying characteristics with much larger barrier heights is attributed to the presence of a large number of surface states (1.2 x 10(13) states/cm(2)/eV) and the internal spontaneous polarization field of GaN, resulted in a significant upward surface band bending or a bare surface barrier height as high as of 2.9 eV. Using the S parameter of 0.48 (measured from the work function dependence of Schottky barrier height) and the mean barrier height of 1.24 eV, the work function of graphene in the Au/graphene/GaN stack could be approximately estimated to be as low as 3.5 eV. The obtained results indicate that graphene is a promising candidate for use as a Schottky rectifier in GaN semiconductors with n-type conductivity.

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