Journal
NANO LETTERS
Volume 14, Issue 6, Pages 3453-3458Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl5009713
Keywords
X-ray grating far-field interferometer; X-ray phase contrast imaging; nanoimprint lithography; cryogenic reactive ion etch; atomic layer deposition; electroplating
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Funding
- National Heart, Lung, and Blood Institute, National Institutes of Health, U.S.
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Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.
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