Journal
NANO LETTERS
Volume 12, Issue 12, Pages 6084-6089Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl302541e
Keywords
Nanofabrication; nanophotonics; nanomechanical systems; diamond; photonic crystal
Categories
Funding
- Defense Advanced Research Projects Agency (QuEST program)
- Defense Advanced Research Projects Agency (QUASAR program)
- Defense Advanced Research Projects Agency (QuINESS program)
- Hewlett-Packard Foundation
- NSF Center for Ultracold Atoms
- AFOSR MURI [FA9550-09-1-0669- DOD35CAP]
- Sloan Foundation
- Natural Science and Engineering Council (NSERC) of Canada
- Element Six postdoctoral fellowship
- Harvard Quantum Optics Center (HQOC)
- Division Of Physics
- Direct For Mathematical & Physical Scien [969816] Funding Source: National Science Foundation
Ask authors/readers for more resources
A variety of nanoscale photonic, mechanical, electronic, and optoelectronic devices require scalable thin film fabrication. Typically, the device layer is defined by thin film deposition on a substrate of a different material, and optical or electrical isolation is provided by the material properties of the substrate or by removal of the substrate. For a number of materials this planar approach is not feasible, and new fabrication techniques are required to realize complex nanoscale devices. Here, we report a three-dimensional fabrication technique based on anisotropic plasma etching at an oblique angle to the sample surface. As a proof of concept, this angled-etching methodology is used to fabricate free-standing nanoscale components in bulk single-crystal diamond, including nanobeam mechanical resonators, optical waveguides, and photonic crystal and microdisk cavities. Potential applications of the fabricated prototypes range from classical and quantum photonic devices to nanomechanical-based sensors and actuators.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available