Journal
NANO LETTERS
Volume 12, Issue 4, Pages 2037-2044Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl300140g
Keywords
Plasmonics; nanoparticles; nanoantennas; optimization; surface-enhanced Raman scattering; electron-beam lithography
Categories
Funding
- Air Force program Deterministic Aperiodic Structures for On-chip Nanophotonic and Nanoplasmonic Device Applications [FA9550-10-1-0019]
- NSF [ECCS-0846651]
- project Engineering structural colors in metal films
- APIC Corporation
- PhotonIC Corporation
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [846651] Funding Source: National Science Foundation
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In the present Letter, we demonstrate how the design of metallic nanoparticle arrays with large electric field enhancement can be performed using the basic paradigm of engineering, namely the optimization of a well-defined objective function. Such optimization is carried out by coupling a genetic algorithm with the analytical multiparticle Mie theory. General design criteria for best enhancement of electric fields are obtained, unveiling the fundamental interplay between the near-field plasmonic and radiative photonic coupling. Our optimization approach is experimentally validated by surface-enhanced Raman scattering measurements, which demonstrate how genetically optimized arrays, fabricated using electron beam lithography, lead to order of ten improvement of Raman enhancement over nanoparticle dimer antennas, and order of one hundred improvement over optimal nanoparticle gratings. A rigorous design of nanoparticle arrays with optimal field enhancement is essential to the engineering of numerous nanoscale optical devices such as plasmon-enhanced biosensors, photodetectors, light sources and more efficient nonlinear optical elements for on chip integration.
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