Journal
NANO LETTERS
Volume 11, Issue 11, Pages 5066-5070Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl203214n
Keywords
Optical lithography; optical forces; spatial light modulator; colloidal nanoparticles
Categories
Funding
- DFG through the Nanosystems Initiative Munich (NIM)
- ERC
- EU through the research training network ICARUS
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Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.
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