Journal
NANO LETTERS
Volume 11, Issue 3, Pages 1351-1357Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl104496r
Keywords
Gradients; solvent vapor annealing; block copolymer; thin film; self-assembly; microfluidic; mixing tree; nanostructure
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Funding
- National Science Foundation (NSF) [DMR-0645586]
- NSF CRIF: MU [CHE 0840401]
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Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluiclic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.
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