Journal
NANO LETTERS
Volume 11, Issue 6, Pages 2533-2537Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl2011824
Keywords
3D nanostructures; colloidal assembly; nanosphere lithography; phase lithography
Categories
Funding
- Singapore National Research Foundation (NRF) through the Singapore-MIT Alliance for Research and Technology (SMART) Centre
- U.S. Air Force Office of Scientific Research (AFOSR) [FA9550-08-1-0379]
- U.S. Army Research Office (ARO) through the Institute for Soldier Nanotechnology (ISN) at MIT
- DOD NDSEG
- NSF GRF [0645960]
Ask authors/readers for more resources
A number of top-down lithographic and bottom-up self-assembly methods have been developed to fabricate three-dimensional (3D) nanostructures to support the recent advances in nanotechnology. But they are limited by a number of factors such as fabrication cost, pattern resolution, and/or flexibility of geometry. Here we present a 3D nanolithography process that utilizes self-assembled nanospheres to create a periodic array of focal spots, which are then replicated across multiple depth in a transparent medium according to the Talbot effect. The Talbot field then exposes a pattern onto the underlying photoresist, recording the 3D intensity distribution. We have demonstrated designable complex 3D periodic structures with 80 nm minimum feature size, roughly one-fourth of the operating wavelength. This approach combines 2D colloidal self-assembly and 3D phase lithography, is robust, cost-effective, and widely applicable to nanoscale research and manufacturing.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available