Journal
NANO LETTERS
Volume 10, Issue 7, Pages 2661-2666Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl101413d
Keywords
Nanocrystal; transistor; FET; germanium; silicon; thin film
Categories
Funding
- NSF [CBET-0756326]
- U S Department of Energy, Office of Science, Office of Basic Energy Sciences
- NSF under the NNIN
Ask authors/readers for more resources
Germanium and silicon have lagged behind more popular II-VI and IV-VI semiconductor materials in the emerging. field of semiconductor nanocrystal thin film devices We report germanium and silicon nanocrystal field-effect transistors fabricated by synthesizing nanocrystals in a plasma, transferring them into solution, and casting thin films Germanium devices show n-type, ambipolar, or p-type behavior depending on annealing temperature with electron and hole mobilities as large as 0 02 and 0 006 cm(2) V-1 s(-1). respectively Silicon devices exhibit n-type behavior without any postdeposition treatment, but are plagued by poor film morphology
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available