Journal
NANO LETTERS
Volume 10, Issue 3, Pages 1000-1005Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl904141r
Keywords
Block copolymer; poly(dimethylsiloxane); solvent anneal; nanowire; self-assembly
Categories
Funding
- Semiconductor Research Corporation
- Office of Naval Research
Ask authors/readers for more resources
The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registration and pattern transfer of sub-10-nm feature sizes is not well established. Here, we report solvent-annealing and templating methods that enable the formation of highly ordered grating patterns with a line width of 8 nm and period 17 nm from a self-assembled poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer, The BCP patterns can be registered hierarchically on a larger-period BCP pattern, which can potentially diversify the available pattern geometries and enables precise pattern registration at small features sizes. Sub- 10-nm-wide tungsten nanowires with excellent order and uniformity were fabricated from the self-assembled patterns using a reactive ion etching process.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available