Journal
NANO LETTERS
Volume 10, Issue 11, Pages 4399-4404Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl101942s
Keywords
Dip-pen; lithography; poly(ethylene glycol); photomask; photoresist; phase-shift; nano; lens; finite element method; simulation
Categories
Funding
- National Science Foundation [CHE-0843832]
- Northwestern NSEC Center (NSF) [EEC-0647560]
- AFOSR
- DARPA
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Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, similar to 100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.
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