Journal
NANO LETTERS
Volume 9, Issue 11, Pages 3826-3830Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl902013g
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Funding
- Department of Energy [DE-FG02-06ER46345]
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Epitaxial Si nanowires grown from Au seeds using the vapor-liquid-solid method begin growing normal to the Si(111) substrate atop a tapered base. After a kinetically determined length, the NWs may kink away from [111] to another crystallographic direction. The smallest NWs prefer growth along < 110 > while larger Si NWs choose either < 111 > or < 112 > based on whether growth conditions favor Au-free sidewalls. Vertical growth normal to the Si(111) substrate is obtained only for slowly growing NWs with Au-decorated sidewalls. At the fastest growth rates, single-crystal Si NWs smoothly, continuously, and randomly vary their growth directions, producing a morphology that is qualitatively different than highly kinked growth.
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