Journal
NANO LETTERS
Volume 9, Issue 4, Pages 1549-1554Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl803641f
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Funding
- German Science Foundation, DFG [CH-159/1]
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Silicon nanowire (SiNW)-based solar cells on glass substrates have been fabricated by wet electroless chemical etching (using silver nitrate and hydrofluoric acid) of 2.7 mu m multicrystalline p(+)nn(+) doped silicon layers thereby creating the nanowire structure. Low reflectance (<10%, at 300-800 nm) and a strong broadband optical absorption (>90% at 500 nm) have been measured. The highest open-circuit voltage (V-oc) and short-circuit current density (J(sc)) for AM1.5 illumination were 450 mV and 40 mA/cm(2), respectively at a maximum power conversion efficiency of 4.4%.
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