Journal
NANO LETTERS
Volume 9, Issue 6, Pages 2306-2310Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl9004892
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Funding
- National Basic Research Program of China [2007CB613202]
- National Nature Science Foundation of China [50673040]
- National High Technology Research and Development Program of China [2007AA03Z334]
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We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 mu m diameter.
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