Journal
NANO LETTERS
Volume 8, Issue 5, Pages 1429-1433Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl080330y
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We report an innovative approach for the fabrication of highly light transmissive, antireflective optical interfaces. This is possible due to the discovery that metallic nanoparticles may be used as a lithographic mask to etch nonstraightforward structures into fused silica, which results in a quasihexagonal pattern of hollow, pillar-like protuberances. The far reaching optical performance of these structures is demonstrated by reflection and transmission measurements at oblique angles of incidence over a broad spectral-region ranging from deep-ultraviolet to infrared light.
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