Robust Microstructures Using UV Photopatternable Semiconductor Nanocrystals

We report an approach to produce predefined patterns of quantum dots and multipod nanocrystals using optical lithography for direct writing of films for optoelectronic and electronic devices. To obtain photopatternability, the nanostructures (for example, CdSe, CdTe, and PbSe nanocrystals) were functionalized by incorporation of the functional ligand t-butoxycarbonyl (t-BOC) which has an acid-labile moiety. This change in the surface chemistry results in the ability to photopattern the semiconductor nanocrystals where desired for a number of optoelectronic device geometries. We demonstrate that the ultimate resolution (line width and spacing) of this technique is below 5 mu m (the limit of our optical apparatus used for writing).