4.3 Article

An investigation into the crystallization and electric flame-off characteristics of 20 mu m copper wires

Journal

MICROELECTRONICS RELIABILITY
Volume 51, Issue 1, Pages 21-24

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.microrel.2010.07.003

Keywords

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Funding

  1. National Cheng Kung University
  2. Center for Micro/Nano Science and Technology (NCKU) [D98-2700]
  3. [NSC 98-2221-E-006-068]
  4. [NSC 98-2622-E-006-024-CC3]

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Copper wires are used in electronic packaging, however the workability and reliability still need to be improved. This work investigates the microstructural characteristics and mechanical properties of annealed wires and un-annealed wires. In addition, the interface bonding characteristics of Al pads are also studied. Experimental results indicate that at the two annealing conditions of 610 degrees C/0.02 s and 510 degrees C/0.4 s, 20 mu m copper wires possessed a fully annealed structure. Compared with the un-annealed wire, the annealed tensile strength and the annealed hardness decreased, and the annealed elongation increased. Through thermal crystallization, the matrix structure transformed from long, thin grains to equiaxed grains and a few annealed twins. The microstructure of the free air ball (FAB) after an EFO process consisted of column-like grains, and grew from the heat-affected zone (HAZ) to the Cu ball. As for bonding testing, the pull strength of the bonded samples increased with increasing the Al film thickness (from 76 nm to 800 nm). (C) 2010 Elsevier Ltd. All rights reserved.

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