Kinetics of growth and consumption of Ni rich phases

In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of theta-Ni2Si depends on the initial Ni thickness. A slow kinetic of consumption of theta-Ni2Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of theta-Ni2Si is observed when theta-Ni2Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed. (C) 2014 Elsevier B.V. All rights reserved.