Journal
MICROELECTRONIC ENGINEERING
Volume 120, Issue -, Pages 146-149Publisher
ELSEVIER
DOI: 10.1016/j.mee.2013.12.015
Keywords
Transient phase; Kinetic; Thermodynamic; Isothermal annealing; Ni rich phases
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In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of theta-Ni2Si depends on the initial Ni thickness. A slow kinetic of consumption of theta-Ni2Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of theta-Ni2Si is observed when theta-Ni2Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed. (C) 2014 Elsevier B.V. All rights reserved.
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