Journal
MICROELECTRONIC ENGINEERING
Volume 110, Issue -, Pages 403-407Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2013.02.098
Keywords
Nanoimprint; Residual layer etching with wet chemical; Micro/nano inverse pyramids
Categories
Funding
- Project NILTEX, EUROPAISCHE UNION Europaischer Fonds fur regionale Entwicklung, Investition in unsere Zukunft
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In this study we present a novel and simple fabrication method for micro- and nano-scale inverse pyramidal structures by a combination of soft UV-NIL and wet chemical etchings. The unique feature of our method is the absence of a RIE process, which is usually applied for removal of residual layer. This is achieved by modifying the imprint resist with an O-2-plasma in asher and subsequent wet etching of residual layer by diluted HF. Combined with conventional anisotropic wet etching step with KOH/IPA, our method allows cost effective fabrication of inverse pyramidal structures on Si-substrate in batch process. Such structures in nano- and micro scale are particularly suitable for light management in photovoltaic, solid state lighting and silicon based photonic. (C) 2013 Elsevier B.V. All rights reserved.
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