Journal
MICROELECTRONIC ENGINEERING
Volume 88, Issue 6, Pages 923-928Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.12.018
Keywords
Titanium dioxide; Nanoimprint lithography; Nanostructures; Optical properties
Categories
Funding
- Center for Nanoscale Mechatronics and Manufacturing [2009K000069]
- Ministry of Education, Science, and Technology of Korea
- National Platform Technology Grant [10033636]
- Ministry of the Knowledge Economy of Korea
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A direct ultraviolet (UV)-assisted nanoimprinting procedure using photosensitive titanium di-n-butoxide bis(2-ethylhexanoate) is employed in this study for the nanopatterning of anatase titanium dioxide (TiO2) structure. Upon annealing at 400 degrees C for 1 h, the lateral shrinkage and thickness shrinkage of the TiO2 nanostructure were 39.6% and 52.5%, respectively, which indicated an anisotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated TiO2 film is gradually increased by improvement in the packing density and crystallinity of the film. According to increasing UV exposure time and annealing temperature, the optical band gap (E-g) of UV-irradiated TiO2 film is red-shifted from 3.73 to 3.33 eV due to the formation of lattice defects, vacancies and voids during the photochemical reaction and due to the effect of quantum confinement during annealing treatment. These results suggest that the refractive index and optical E-g of TiO2 nanostructure could be controlled by tuning the UV exposure time and annealing treatment conditions. Nanopatterns of TiO2 fabricated by direct UV-assisted nanoimprint lithography are potential candidates for use in protective coatings for optical mirrors and filters, high-reflectivity mirrors, broadband interference filters and active electro-optical devices where ordered surface nanostructures could be necessary. (c) 2010 Elsevier B.V. All rights reserved.
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