Journal
MICROELECTRONIC ENGINEERING
Volume 88, Issue 8, Pages 2736-2739Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.12.046
Keywords
Electron-beam lithography; Multilevel; Reflow; Molecular weight; Microprism; Blazed grating; Stamps; Nanoimprint lithography
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Funding
- EC [NMP 214249]
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A novel process route is presented for the fabrication of three-dimensional (3D) patterns with both vertical and inclined profiles in close vicinity on the same substrate. The 3D patterns were generated by dose-modulated electron-beam lithography (EBL) in polymeric resist combined with a thermal annealing (reflow) post-treatment at a moderate temperature. Thus, technical limitations usually connected with grayscale EBL to manufacture continuous patterns were overcome. 3D sawtooth structures which exhibit both sharp and continuous profiles were generated and slopes up to 270 with smooth surfaces were achieved. (C) 2010 Elsevier B.V. All rights reserved.
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