Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 4, Pages 663-667Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2009.09.007
Keywords
Electron-beam lithography; Photoresist; Polymeric nanostructures
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Funding
- Spanish Ministry of Science and Innovation [TEC2008-06574-C03-03, TEC2008-06574-C03-01]
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We report the fabrication of periodic lattices of high aspect-ratio nano-pillars made of SU-8 polymeric material by using direct electron-beam writing. Process parameters are optimized in order to control proximity effects and photoacid-generator diffusion determining feature resolution and material stiffness. We demonstrate nanostructured surfaces consisting of lattices of SU-8 nano-pillars with aspect-ratio as high as 3.8:1, improving previous reported results significantly. We also show the capability of these structures to trap liquid-water infiltrated among the SU-8 nano-pillars after proper chemical treatment. (C) 2009 Elsevier B.V. All rights reserved.
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