Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere

The periodic arrays of nanostructure were successfully patterned on Si wafers by ultraviolet nanoimprint lithography (UV-NIL) using nanosphere lithography (NSL). Two-dimensional (2D) well ordered self-assembled arrays were obtained on Si wafer by using nanosphere and the tilted-drain method. We tried to combine two techniques and hard mold of Si mold for NIL and polymer mold of acrylate-based polymer were fabricated by NSL. The Si master mold and polymer mold were formed by Cr lift-off and ICP-RIE process. The surface has a low surface energy at the interface with 1 H. 1H, 2H, 2H-perfluorooctyl-trichlorosilane (FOTS) vapor-coating, which can eliminate the problem of the adherence to the surface of the mold during demolding. Finally, nanopatterns were formed by UV-NIL, where the residual layer was not observed. (C) 2009 Elsevier B.V. All rights reserved.