Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 5-8, Pages 693-695Publisher
ELSEVIER
DOI: 10.1016/j.mee.2009.12.077
Keywords
Polymer replication; Lab-on-chip; Electron beam lithography; Organic lasers; Waveguides; PMMA
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Efficiently combining active and passive elements in integrated optics is a key ingredient for their successful employment. Here, we present the fabrication of an optimized PMMA substrate structure for improved coupling of laser light generated by organic semiconductor distributed feedback lasers into single-mode deep ultraviolet induced waveguides. For production, electron beam lithography on an oxidized silicon wafer and subsequent reactive ion etching is used to form the feedback grating of the laser. Afterwards, an aligned second electron beam lithography step on top of the grating allows the fabrication of a topographical step of 1.67 mu m on the edges of the grating area. Metal is evaporated on this resulting master structure serving as a plating base for electroforming of a Ni tool. The tool is then used for hot embossing of the structure into PMMA bulk material. On a length of 500 mu m the imprinted grating lines, having a period of 200 nm, are 100 nm wide and 60 nm high. Aligned deep ultraviolet exposure to induce a passive single- or multi-mode waveguide and co-evaporation of the active material ALq(3):DCM finish the coupling region. This structure optimizes the coupling of laser light generated in the laser structure into the passive waveguide. In combination with microfluidic channels, the laser light can be considered for sensing applications on a PMMA lab-on-chip system. (C) 2009 Elsevier B.V. All rights reserved.
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