Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 11, Pages 2332-2337Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.04.001
Keywords
Fully vectorial beam propagation method; E-beam lithography; Computer generated hologram
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Funding
- Lithuanian State Science and Studies Foundation
- Agency of International Science and Technology Development Programmes in Lithuania
- European Cooperation in the field of Scientific and Technical research (COST) programme [MP0702]
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A fully vectorial 3D beam propagation method (RPM) has been applied to obtain a required pattern of computer generated hologram (CGH) with a variable profile of four phase levels. The computer reconstruction of the CGH image having one and two focal spots was performed by application of the fully vectorial 3D BPM method. After transferring the CGH by EBL technique an adequate phase profile was obtained. Inter-level parameter method was developed to obtain the estimated an electron beam dose required for the even topographical patterning. Using this method, an EBL exposure dose determined to achieve the required relief amplitude of 1.29 mu m was 43 mu C/cm(2). The manufactured holograms showed that the overall proposed production process, from the 3D RPM computer simulation to e-beam lithography, can be used to obtain good quality product with reasonable time and computational resources. (C) 2010 Elsevier B.V. All rights reserved.
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