Journal
MICROELECTRONIC ENGINEERING
Volume 86, Issue 4-6, Pages 752-756Publisher
ELSEVIER
DOI: 10.1016/j.mee.2009.01.068
Keywords
Soft lithography; PVA; PMMA; DXRL; Microneedles
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We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 pm were fabricated through double-exposure deep Xray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed. (C) 2009 Elsevier B.V. All rights reserved.
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